ICP-OES MICS Full-Spectrum ICP-OES for Multi-Element Analysis | Up to 70+ Elements Detection at ppm Accuracy

High-Performance Full-Spectrum ICP-OES for Multi-Element Analysis

Author：JIANGXI AIYI HI-TECH CO., LTD. Click： Time：2025-11-25 13:19:11

Specially designed for high demand multi-element testing

A recent German client requested the ability to test over 70 elements, including Ce, Sn, Pd, Ru, Si, Ag, Bi, I, Cl, Ca, Mg, Pb, etc., while maintaining stable ppm level accuracy.

With its advanced optical components, efficient CCD detectors, and excellent plasma stability, our full spectrum ICP-OES provides the required precision analysis capabilities.

Key performance characteristics

1. Full spectrum detection (165-900 nm)

Covering the deep ultraviolet to visible light range
Measure all wavelengths in one exposure
No moving parts → Long term stability and low maintenance

2. Efficient CCD detector (3000000+pixels)

Fast reading speed ≥ 2 MHz
Pixel resolution ≤ 0.003 nm
Continuous pixel array → flexible wavelength selection
Natural anti overflow design of strong spectrum

3. Excellent detector cooling (reaching -45 ° C within 3 minutes)

Third level semiconductor cooling
Extremely low dark current
Very suitable for detecting trace metals at ppm or ppb levels

Advanced Optical Systems

Mid step grating+prism two-dimensional dispersion
35-40 ° C constant temperature lamp room
Purification consumption of argon/N ₂ ultraviolet wavelength<3 L/min
High energy transmission ensures stable baseline and sharp peak shape

Optical resolution (FWHM):

189 nanometers<0.007 nanometers
Calcium 393 nanometers<0.017 nanometers
Barium 614 nm<0.024 nm
K 766nm<0.035nm

These parameters ensure reliable separation of complex spectral lines, even in multi-element matrices.

Stable plasma system for consistent analysis

Vertical torch to reduce substrate interference
Solid state RF generator (500-1600W, 27.12MHz)
PTFE protected RF coils have corrosion resistance
Three channel MFC control (cooling, auxiliary, spray)
Precision 0.01 liters per minute

Even in long-term unmanned workflows, this ensures stable plasma conditions.

High analytical throughput

Measure ≥ 50 elements per minute
The integration time of each line is ≥ 10 seconds
Sample consumption<2 mL
Support simultaneous quantification of 70+elements

Very suitable for laboratory processing of large quantities of multi matrix samples

Accuracy and long-term stability

Linearity ≥ 10 ⁶ (manganese 257.6 nm, r ≥ 0.9996)
Repeatability RSD ≤ 0.5% (10 repetitions)
4-hour continuous analysis with RSD<1.0%
Support real-time internal standard calibration

These performance indicators ensure high reliability for environmental, industrial, and material applications.

Application field

This full spectrum ICP-OES is suitable for:

Metallurgical analysis (Sn, Pd, Ru, Ag, Bi)
Battery Materials and New Energy (Cerium, Silicon, Potassium, Magnesium)
Environmental monitoring (lead, calcium, chlorine)
Semiconductor chemicals (trace impurities)
Industrial wastewater detection
High purity raw materials
Geological and mineral exploration

Its ability to handle high matrix, multi-element, and trace analysis makes it a universal tool in modern analytical laboratories.

Why choose our ICP-OES?

Full spectrum single exposure
Ppm ppb sensitivity
Accuracy and stability at the German level
Automatic gas control and low operating costs
Specially designed for multi matrix and high-throughput workflows
Verified analytical performance of over 70 elements

If your laboratory requires fast and accurate multi-element measurements, our full spectrum ICP-OES can provide an efficient and stable solution.

For technical specifications, demonstration data, or application support, please contact our team.

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High-Performance Full-Spectrum ICP-OES for Multi-Element Analysis

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